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1

Recent advances in photosensitive polyimides

Hellmut Ahne, Rainer Leuschner, Roland Rubner

Journal:

Polymers for Advanced Technologies

Year:

1993

Language:

english

File:

PDF, 2.56 MB

english, 1993

2

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Application aspects of the Si-CARL bilayer process

Sebald, Michael, Berthold, Joerg, Beyer, Michael, Leuschner, Rainer, Noelscher, Christoph, Scheler, Ulrich, Sezi, Recai, Ahne, Hellmut, Birkle, Siegfried, Ito, Hiroshi

Year:

1991

Language:

english

File:

PDF, 607 KB

english, 1991

3

The Top-CARL, process: A patterning technique for organic materials

Dr. Rainer Leuschner, Hellmut Ahne, Albert Hammerschmidt, Günter Kolodziej, Jens Nordmann, Erwin Schmidt, Michael Sebald, Recai Sezi

Journal:

Advanced Materials

Year:

1992

Language:

english

File:

PDF, 394 KB

english, 1992

4

Vernetzungs- und Oligomerisierungsreaktionen mit dem Bisketen 1.4-Bis(carbonylen)-cyclohexan

Von Walter K. R. Franke, Hellmut Ahne

Journal:

Macromolecular Materials and Engineering

Year:

1972

Language:

german

File:

PDF, 594 KB

german, 1972

5

Spirocyclische Verbindungen, V: 2.8-Dicyclohexyl-dispiro[3.1.3.1]decan und 2.12-Dicyclohexyl-tetraspiro[3.1.1.1.3.1.1.1]hexadecan

Emil Buchta, Hellmut Ahne

Journal:

European Journal of Inorganic Chemistry

Year:

1965

Language:

german

File:

PDF, 316 KB

german, 1965

6

Photopatternable insulating materials

Hellmut Ahne, Roland Rubner, Recai Sezi

Journal:

Applied Surface Science

Year:

1996

Language:

english

File:

PDF, 470 KB

english, 1996

7

Functionalized polymers for high-resolution photolithography

Michael Sebald, Hellmut Ahne, Rainer Leuschner, Recai Sezi

Journal:

Polymers for Advanced Technologies

Year:

1994

Language:

english

File:

PDF, 1.54 MB

english, 1994

8

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Benefits and prospects of aqueous silylation for novel dry developable high-resolution resists

Sezi, Recai, Sebald, Michael, Leuschner, Rainer, Ahne, Hellmut, Birkle, Siegfried, Borndoerfer, Horst, Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 440 KB

english, 1990

9

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Chemical amplification of resist lines: a novel sub-half-micron bilayer resist tehnique for NUV and deep-UV lithography

Sebald, Michael, Leuschner, Rainer, Sezi, Recai, Ahne, Hellmut, Birkle, Siegfried, Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 542 KB

english, 1990

10

Dedicated polymers for future progress in microelectronics

Rubner, Roland, Ahne, Hellmut, Sebald, Michael, Sezi, Recai

Journal:

Makromolekulare Chemie Macromolecular Symposia

Year:

1992

Language:

english

File:

PDF, 385 KB

english, 1992